Сибирский федеральный университет

Тип публикации: статья из журнала

Год издания: 2017

Идентификатор DOI: 10.1016/j.jmmm.2016.12.051

Ключевые слова: Fe-Si films, Ferromagnetic resonance, Iron silicide, Magnetic anisotropy, Oblique sputtering, Thin magnetic films

Аннотация: The structure and the magnetic anisotropy of the films obtained by simultaneous deposition of iron and silicon on n-Si(111) 7×7 at 130 °C are investigated. It is found the uniaxial magnetic anisotropy field for the Fe1−xSix films with x=0.25 (Fe3Si stoichiometric ratio) deposited on Si(111) 7×7 depends on both the surface miscut angle and the oblique sputtering direction and changes from 0.82 Oe up to 117.26 Oe. © 2016 Elsevier B.V.

Журнал: Journal of Magnetism and Magnetic Materials

Выпуск журнала: Vol. 440

Номера страниц: 161-163

ISSN журнала: 03048853

Издатель: Elsevier B.V.

• Yakovlev I.A. (Siberian State Aerospace University, 31 Krasnoyarsky Rabochy Av., Krasnoyarsk, Russian Federation, Kirensky Institute of Physics, Federal Research Center KSC SB RAS, Akademgorodok 50, bld. 38, Krasnoyarsk, Russian Federation)
• Tarasov I.A. (Siberian State Aerospace University, 31 Krasnoyarsky Rabochy Av., Krasnoyarsk, Russian Federation, Kirensky Institute of Physics, Federal Research Center KSC SB RAS, Akademgorodok 50, bld. 38, Krasnoyarsk, Russian Federation)
• Lyashchenko S.A. (Siberian State Aerospace University, 31 Krasnoyarsky Rabochy Av., Krasnoyarsk, Russian Federation, Kirensky Institute of Physics, Federal Research Center KSC SB RAS, Akademgorodok 50, bld. 38, Krasnoyarsk, Russian Federation)

• Scopus