FMR and TEM Studies of Co and Ni Nanoparticles Implanted in the SiO2 Matrix

Тип публикации: статья из журнала

Год издания: 2011

Идентификатор DOI: 10.1007/s00723-011-0218-4

Ключевые слова: Energy dispersive X ray spectroscopy, Face-centered cubic structure, Fused silica plates, G factors, Hexagonal close packing, High dose, High-dose implantation, Implantation dose, Implanted samples, Line shape, Magnetic parameters, matrix, Metal nanoparticles, Ni Nanoparticles, Nonsymmetric, Out-of-plane, Room temperature, Spherical shape, Subsurface layer, TEM, Temperature dependence, Thin magnetic films, Uniaxial magnetic anisotropy, Cobalt, Fused silica, Magnetic anisotropy, Nanoparticles, Silica, Silicon compounds, Transmission electron microscopy, X ray spectroscopy, Ferromagnetic resonance

Аннотация: Fused silica plates have been implanted with 40 keV Co+ or Ni+ ions to high doses in the range of (0.25-1.0) x 10(17) ions/cm(2), and magnetic properties of the implanted samples have been studied with ferromagnetic resonance (FMR) technique supplemented by transmission electron microscopy, electron diffraction and energy dispersive X-ray spectroscopy. The high-dose implantation with 3d-ions results in the formation of cobalt and nickel metal nanoparticles in the irradiated subsurface layer of the SiO2 matrix. Co and Ni nanocrystals with hexagonal close packing and face-centered cubic structures have a spherical shape and the sizes of 4-5 nm (for cobalt) and 6-14 nm (for nickel) in diameter. Room-temperature FMR signals from ensembles of Co and Ni nanoparticles implanted in the SiO2 matrix exhibit an out-of-plane uniaxial magnetic anisotropy that is typical for thin magnetic films. The dose and temperature dependences of FMR spectra have been analyzed using the Kittel formalism, and the effective magnetization and g-factor values have been obtained for Co- and Ni-implanted samples. Nonsymmetric FMR line shapes have been fitted by a sum of two symmetrical curves. The dependences of the magnetic parameters of each curve on the implantation dose and temperature are presented.

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Издание

Журнал: APPLIED MAGNETIC RESONANCE

Выпуск журнала: Vol. 40, Is. 3

Номера страниц: 363-375

ISSN журнала: 09379347

Место издания: WIEN

Издатель: SPRINGER WIEN

Авторы

  • Edelman I.S. (L.V. Kirensky Institute of Physics,Siberian Branch,Russian Academy of Sciences)
  • Petrakovskaja E.A. (L.V. Kirensky Institute of Physics,Siberian Branch,Russian Academy of Sciences)
  • Petrov D.A. (L.V. Kirensky Institute of Physics,Siberian Branch,Russian Academy of Sciences)
  • Zharkov S.M. (Siberian Federal University)
  • Khaibullin R.I. (Zavoisky Physical-Technical Institute,Russian Academy of Sciences)
  • Nuzhdin V.I. (Zavoisky Physical-Technical Institute,Russian Academy of Sciences)
  • Stepanov A.L. (Zavoisky Physical-Technical Institute,Russian Academy of Sciences)

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