Тип публикации: доклад, тезисы доклада, статья из сборника материалов конференций
Конференция: Euro-Asian Symposium on Trends in Magnetism (EASTMAG); RAS,UB, M N Miheev Inst Met Phys, Ekaterinburg, RUSSIA; RAS,UB, M N Miheev Inst Met Phys, Ekaterinburg, RUSSIA
Год издания: 2019
Идентификатор DOI: 10.1088/1742-6596/1389/1/012028
Аннотация: CoNi / Si / FeNi / Si structures were synthesized by ion-plasma sputtering. A negative hysteresis loop bias was detected at the thickness of the silicon layer was less than 2 nm and the temperature was less than 100 K. A positive hysteresis loop bias was detected at the thickness of the silicon layer was more than 2 nm and the temperature greater than 100K. © Published under licence by IOP Publishing Ltd.
Издание
Журнал: Journal of Physics: Conference Series
Выпуск журнала: Vol. 1389, Is. 1
Номера страниц: 12028
ISSN журнала: 17426588
Издатель: Institute of Physics Publishing
Персоны
- Kobyakov A.V. (Siberian Fed Univ, Prospect Svobodny 79, Krasnoyarsk 660041, Russia; Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Turpanov I.A. (Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Patrin G.S. (Siberian Fed Univ, Prospect Svobodny 79, Krasnoyarsk 660041, Russia; Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Yushkov V.I. (Siberian Fed Univ, Prospect Svobodny 79, Krasnoyarsk 660041, Russia; Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Yarikov S.A. (Siberian Fed Univ, Prospect Svobodny 79, Krasnoyarsk 660041, Russia; Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Volochaev M.N. (Russian Acad, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia)
- Zhivaya Ya A. (Siberian Fed Univ, Prospect Svobodny 79, Krasnoyarsk 660041, Russia)
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