Тип публикации: статья из журнала
Год издания: 2019
Идентификатор DOI: 10.1134/S1063783419100354
Ключевые слова: aluminum-doped zinc oxide, atomic layer deposition, structural and optical properties, thermoelectric properties, thin films
Аннотация: Abstract: Aluminum-doped zinc oxide thin films have been grown by atomic layer deposition at a temperature of 200°C. Using X-ray diffraction, it has been established that the ZnO:Al thin films exhibits the reflections from the (100), (002), (110), and (20
Издание
Журнал: Physics of the Solid State
Выпуск журнала: Vol. 61, Is. 10
Номера страниц: 1904-1909
ISSN журнала: 10637834
Издатель: Pleiades Publishing
Персоны
- Tambasov I.A. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia)
- Volochaev M.N. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia)
- Voronin A.S. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Siberian Branch, Krasnoyarsk 660036, Russia)
- Evsevskaya N.P. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia; Russian Acad Sci, Krasnoyarsk Sci Ctr, Inst Chem & Chem Technol, Siberian Branch, Krasnoyarsk 660036, Russia)
- Masyugin A.N. (Siberian State Univ Sci & Technol, Krasnoyarsk 660014, Russia)
- Aleksandrovskii A.S. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia; Siberian Fed Univ, Krasnoyarsk 660041, RussiaArticle)
- Smolyarova T.E. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Siberian Branch, Krasnoyarsk 660036, Russia; Siberian Fed Univ, Krasnoyarsk 660041, RussiaArticle)
- Nemtsev I.V (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia)
- Lyashchenko S.A. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia)
- Bondarenko G.N. (Russian Acad Sci, Krasnoyarsk Sci Ctr, Inst Chem & Chem Technol, Siberian Branch, Krasnoyarsk 660036, Russia)
- Tambasova E.V (Siberian State Univ Sci & Technol, Krasnoyarsk 660014, Russia)
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