Morphology and magnetic properties of amorphous Co-p and Co-Ni-P films

Тип публикации: статья из журнала (материалы конференций, опубликованные в журналах)

Год издания: 2015

Идентификатор DOI: 10.4028/www.scientific.net/SSP.233-234.686

Ключевые слова: Amorphous films, Chemical deposition, Surface morphology, Amorphous films, Atomic force microscopy, Deposition, Morphology, Nickel, Optical Kerr effect, Surface morphology, Chemical deposition, Co-P alloy, Co-P films, Ni atoms, Polar Kerr effect, Rate of deposition, Saturation fields, Cobalt

Аннотация: Amorphous Co-P and Co-Ni-P films fabricated by chemical deposition under the same conditions are investigated. It is demonstrated that the phosphorous content in the Co-Ni-P exceeds than in the Co-P films by 1.5-2%. The atomic force microscopy analysis of the surface morphology shows that incorporation of Ni atoms in the Co-P alloy leads to coarsening of grains due to the higher rate of deposition of Ni atoms as compared with the rate of deposition of Co atoms. The reduction of the dispersion of the polar Kerr effect saturation field in the Co-Ni-P films is attributed to ordering of Co-Ni atomic pairs. © (2015) Trans Tech Publications, Switzerland.

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Издание

Журнал: (29 June 2014 through 3 July 2014

Выпуск журнала: Vol. 233-234

Номера страниц: 686-689

Авторы

  • Chzhan A.V. (Siberian Federal University)
  • Seredkin V.A. (Kirensky Institute of Physics, Russian Academy of Sciences, Siberian Branch)
  • Patrin G.S. (Siberian Federal University)
  • Zabluda V.N. (Kirensky Institute of Physics, Russian Academy of Sciences, Siberian Branch)
  • Rudenko R.Y. (Siberian Federal University)
  • Zubavichus Y.V. (National Research Center ‘Kurchatov Institute')
  • Mikhlin Y.L. (Institute of Chemistry and Chemical Technology, Russian Academy of Sciences, Siberian Branch)

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